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Chemical Vapor Deposition: Thermal and Plasma Deposition of Electronic Materials

by Sivaram, Srinivasan | HC | Acceptable
ThriftBooks
  • (3572457)
US $55.77
Condition:
Acceptable
“Readable copy. Pages may have considerable notes/highlighting. ~ ThriftBooks: Read More, Spend ”... Read moreabout condition
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eBay item number:196250473087

Item specifics

Condition
Acceptable
A book with obvious wear. May have some damage to the cover but integrity still intact. The binding may be slightly damaged but integrity is still intact. Possible writing in margins, possible underlining and highlighting of text, but no missing pages or anything that would compromise the legibility or understanding of the text. See the seller’s listing for full details and description of any imperfections. See all condition definitionsopens in a new window or tab
Seller Notes
“Readable copy. Pages may have considerable notes/highlighting. ~ ThriftBooks: Read More, Spend ...
Binding
Hardcover
Weight
1 lbs
Product Group
Book
IsTextBook
Yes
ISBN
9780442010799
Publication Year
1995
Format
Hardcover
Language
English
Book Title
Principles of Chemical Vapor Deposition : Thermal Plasma Deposition of Electronic Materials
Author
Srinivasan Sivaram
Item Length
9.1in
Publisher
Springer London, The Limited
Genre
Technology & Engineering
Topic
General, Electronics / Circuits / General, Electrical
Item Width
5.9in
Item Weight
19.4 Oz
Number of Pages
Xii, 292 Pages

About this product

Product Information

In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.

Product Identifiers

Publisher
Springer London, The Limited
ISBN-10
0442010796
ISBN-13
9780442010799
eBay Product ID (ePID)
1054698

Product Key Features

Book Title
Principles of Chemical Vapor Deposition : Thermal Plasma Deposition of Electronic Materials
Author
Srinivasan Sivaram
Format
Hardcover
Language
English
Topic
General, Electronics / Circuits / General, Electrical
Publication Year
1995
Genre
Technology & Engineering
Number of Pages
Xii, 292 Pages

Dimensions

Item Length
9.1in
Item Width
5.9in
Item Weight
19.4 Oz

Additional Product Features

Number of Volumes
1 Vol.
Lc Classification Number
Tk7888.4tk1-9971
Copyright Date
1995
Lccn
94-039696
Dewey Decimal
621.3815/2
Series
Electrical and Electronics Technology Handbooks
Dewey Edition
20
Illustrated
Yes

Item description from the seller

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