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Handbook of Chemical Vapor Deposition Principles, Technology and Applications 2e

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Item specifics

Condition
Brand New: A new, unread, unused book in perfect condition with no missing or damaged pages. See the ...
ISBN
9780815514329
Publication Year
1999
Type
Textbook
Format
Hardcover
Subject Area
Mechanical Engineering
Language
English
Publication Name
Handbook of Chemical Vapor Deposition: Principles, Technology and Applications
Item Height
229mm
Author
Hugh O. Pierson
Publisher
William Andrew Publishing
Item Width
152mm
Item Weight
970g
Number of Pages
506 Pages

About this product

Product Information

Keeping up with the latest advances in technology doesn't have to be difficult, especially with a flexible and relatively uncomplicated technology like Chemical Vapor Deposition. The need to keep up with such a technology, though, is paramount. Consider that the size of the Chemical Vapor Deposition market is estimated to have doubled in the last six years. The technology has developed at a rapid rate as well, and the number and scope of its applications and their impact on the markets they serve have increased considerably. Two major contributors to this growth are plasma CVD and metallo-organic CVD (MOCVD). Both of these technologies are extensively reviewed in this new edition of the Handbook of Chemical Vapor Deposition. Also of growing importance is the use of CVD in the production of semiconductor and related applications, which are heavily emphasized in this handbook providing a systematic and detailed analysis of the role of CVD in this field. Other applications discussed include the coating of tools, bearings and other war and corrosion resistant products, including those used in the automobile, aerospace, and machine tool industries. The key benefits to CVD technology, as laid out in the 2nd Edition of the Handbook of Chemical Vapor Deposition is that it is possible to coat almost any shape product of almost any size that it can be used to produce fibers, monoliths, foams, and powders and that the process is relatively uncomplicated and flexible. Contents: Fundamentals of Chemical Vapor Deposition The Chemistry of CVD Metallo-Organic CVD (MOCVD) CVD Process and Equipment The CVD of Metals Allotropes of Carbon Non-Metallic Elements Ceramic Materials: Carbides Ceramic Materials: Nitrides Ceramic Materials: Oxides. Application Specific Topics: Electronic Applications Semiconductors Electronic Applications Conductors, Insulators, and Diffusion Barriers Optoelectronic and Ferroelectric Applications Optical Applications Wear-and Corrosion-Resistant Applications Cutting-Tool Applications Fiber, Powder, and Monolithic Applications.

Product Identifiers

Publisher
William Andrew Publishing
ISBN-13
9780815514329
eBay Product ID (ePID)
88442079

Product Key Features

Subject Area
Mechanical Engineering
Author
Hugh O. Pierson
Publication Name
Handbook of Chemical Vapor Deposition: Principles, Technology and Applications
Format
Hardcover
Language
English
Publication Year
1999
Type
Textbook
Number of Pages
506 Pages

Dimensions

Item Height
229mm
Item Width
152mm
Item Weight
970g

Additional Product Features

Title_Author
Hugh O. Pierson
Country/Region of Manufacture
United States

Item description from the seller

Business seller information

Value Added Tax Number:
  • GB 428215114
freshlyprintedbooks

freshlyprintedbooks

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